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Protocols

Note: These procedures are mainly for the convenience of Wanunu lab members, and information within them may not be complete. Use at your discretion and obey all safety regulations. Do not hesitate to contact Dr. Wanunu for a full description of anything that you find unclear!

SOPs
Atomic-Layer Deposition (ALD, Arradiance Gemstar)

Buffered Oxide Etch

DNA Melting Curves using CFX96

Electron-Beam Lithography (@ EM facility, NEU)

Ellipsometry (Rudolph Research AutoEL II)

Measuring Contact Angles (Homemade apparatus)

Minimizing N2 Leaks

Reactive Ion Etch and Oxygen Plasma Cleaner (Technics micro-RIE 800)PAGE Electrophoresis

PAGE Electrophoresis

Poor Man Elastomeric Gasket (For single-molecule experiments)

Pore Cleaning Protocol

Wafer Fabrication (using alignment-free photolithography)

MSDS
3-Aminopropyl-phosphonic Acid

Acetone

Boric Acid

Buffer solution pH4

Buffer solution pH7

Buffer solution pH10

Chloroform

Ethylenediamine Tetraacetic Acid

Hydrofluoric Acid

Hydrogen Peroxide

Magnesium Chloride Hexahydrate

Octanediphosphonic Acid

Phenol

Phosphonic Acid

Phosphorous Acid

PMMA

Potassium Chloride (KCl)

Potassium Hydroxide

Reagent Alcohol

Silicone Rubber Thinner

Sodium Acetate Anhydrous

Sodium Hydroxide

Sulfuric Acid

TDMAHf

TDMA-Zr

TEMED

Tetramethylammonium Hydroxide Pentahydrate

Triethylamine
Tris (Hydroxymethyl)

UltraSpec Agarose

Urea